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photovoltaic material and found that it is suitable for solar cell fabrication by the sputtering process. 2. Experimental Methods 2.1 Preparation of ZnInS thin film ZnInS thin films were …
quaternary target. Definitely, the process can be tuned to obtain such a composition variation by using two targets, but it was not the main goal of this study to compete, at first, on the …
CZTSe solar cells with 11.95% peak efficiency have been achieved by sputtering a quaternary compound target using the selenization process. ...
This review first introduces the principle and the advantages of magnetron sputtering of perovskite thin films, where the role of plasma is highlighted. Then, the effects of …
Here, we focus on the use of sputtered indium tin oxide (ITO) as a barrier layer to stop major degradations. To mitigate efficiency losses of cells with the ITO barrier, we …
1 · Tutsch L, Sai H, Matsui T, et al. The sputter deposition of broadband transparent and highly conductive cerium and hydrogen co-doped indium oxide and its transfer to silicon …
We demonstrated a method to reveal the impact of sputter damage on the perovskite solar cell performance by correlating sputter damage-induced losses with …
We demonstrated a method to reveal the impact of sputter damage on the …
This research study examined properties of SnO 2 films deposited at different sputter pressure and room temperate by magnetron sputtering (see Fig. 3) for optimisation of the perovskite …
A tandem cell approach, using a thin film technology in conjunction with the well-established Si technology, is a promising technique, achieving cells with 30%, and higher, …
TCOs, such as sputtered indium tin oxide (ITO), are therefore critical to improve the lateral charge carrier transport in the solar cell structure. However, the sputtering process …
In this study, earth-abundant thin film Cu 2 ZnSnSe 4 (CZTSe) solar cells were fabricated by the magnetron sputtering of a quaternary compound target. Precursor films were deposited in a designed chemical composition …
The sputter process parameters such as target power density and working pressure in the chamber are the key elements for the optimization of deposition. ... curves of …
Our standard sputtering targets for thin-film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, …
Radio frequency (RF) magnetron sputtering was used to deposit tungsten disulfide (WS2) thin films on top of soda lime glass substrates. The deposition power of RF …
However, most perovskite solar cells are fabricated by a solution process, which is not suitable for such structured substrates since the thickness of the resulting films is …
"The composition and structural properties of the CZTS layer depend on the deposition process and the sulfurization," explains Dalapati. "By using a single-step sputtering …